ARCNL Excellence Postdoctoral Fellowship in the Netherlands: Complete Guide for Physicists

The ARCNL Excellence Postdoctoral Fellowship in the Netherlands is a premium opportunity for outstanding young researchers in physics and related fields who want to work at the interface of fundamental science and cutting-edge semiconductor technology. Hosted by the Advanced Research Center for Nanolithography (ARCNL) in Amsterdam, this fellowship offers a highly competitive package, world-class labs and a direct link to industry leader ASML. 

In this guide, you will find an overview of the programme, key benefits, eligibility criteria, funding details, the step-by-step application process, and practical advice to help you submit a strong proposal.

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Introduction to the ARCNL Excellence Postdoctoral Fellowship

ARCNL is a public–private research centre that focuses on the fundamental physics and chemistry behind nanolithography, with strong emphasis on extreme ultraviolet (EUV) light sources, nanophotonics, materials science and metrology for semiconductor manufacturing. 

The ARCNL Excellence Postdoctoral Fellowship is designed to: 

• • Attract outstanding postdoctoral researchers from outside ARCNL

  • Support pioneering research in collaboration with both academia and high-tech industry

  • Accelerate the career development of

    talented physicists and engineers

Selected fellows develop and execute their own project within one of ARCNL’s research groups, working closely with senior scientists and industrial partners.

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Why the ARCNL Excellence Postdoctoral Fellowship Matters

Direct bridge between academia and industry

Semiconductor manufacturing is a strategic global industry. ARCNL sits right in the middle of this ecosystem, as a partnership between the Dutch Research Council (NWO), the University of Amsterdam, Vrije Universiteit Amsterdam, the University of Groningen and ASML. 

Therefore, fellows gain:

• • Access to real-world challenges in lithography and nanometrology

  • Regular interaction with ASML scientists and engineers

  • A CV that speaks to both academic and industrial employers

For early-career researchers, especially those interested in applied physics or photonics, this combination is rare and highly valuable.

Excellent environment for postdoctoral research in nanolithography

ARCNL is organised into three departments: Source, Metrology and Materials. Research topics include: 

• • EUV generation and plasma physics

  • High-harmonic generation and ultrafast nanophotonics

  • Nanoscale imaging and metrology

  • Materials and surface science for EUV lithography

Fellows therefore work in a dense cluster of

expertise with access to advanced lasers, vacuum systems, cleanrooms and highly specialised diagnostics.

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Eligibility: Who Is the Fellowship For?

According to the official call, ARCNL welcomes highly talented and motivated candidates who meet the following criteria: 

• • Hold a PhD in physics or a related field, or will obtain their PhD within one year after the application deadline

  • Have an excellent academic and publication record

  • Are self-driven and creative, able to conduct independent research at a high level

  • Demonstrate strong analytical, experimental and/or computational skills

  • Possess excellent scientific writing and communication skills

  • Enjoy working in teams and across disciplines

  • Show potential to supervise MSc/PhD students and manage a project

For international applicants (including Indian researchers)

ARCNL explicitly invites applications from researchers outside ARCNL, and its working-abroad resources support international hires with relocation and integration. 

For candidates from India and other regions, this makes the ARCNL Excellence Postdoctoral Fellowship a strong option if you:

• • Want a postdoc in Europe with high-impact applied physics

  • Aim to move between academia and industry later in your career

  • Prefer an English-speaking, international research environment

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Key

Features, Funding and Working Conditions

The fellowship offers conditions that are competitive within the Dutch research system and aligned with sectoral agreements. While exact salary scales are not detailed in the advertisement, ARCNL highlights: 

• • Competitive salary and full-time employment

  • Two-year contract, with the possibility of a one-year extension after positive evaluation 

  • World-class equipment and research infrastructure

  • Ambitious, collaborative scientific environment

  • Strong links to ASML and other partners in the Dutch innovation ecosystem

As an ARCNL employee, you also benefit from the Dutch system’s social security, pension contributions, paid leave and access to international schools and public services in Amsterdam.

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Research Areas and Possible Projects

Fellows select a research topic in alignment with an ARCNL group. The main research lines include: 

• • Source physics and EUV plasma processes – generation and optimisation of EUV light

  • Metrology and imaging – ultrafast soft X-ray metrology, high-harmonic metrology and nanometrology

  • Materials and surfaces – contact dynamics, surface chemistry and materials theory for EUV optics

Within these themes, you might: